High performance soft materials where hardware meets biology:

A biocompatible, viscoelastic negative photoresist (Young’s Modulus ~ 5 MPa) with a low refractive index. Seamlessly integrated into lithographic processes.

A biocompatible, viscoelastic negative photoresist (Young’s Modulus ~ 500 MPa) with a low refractive index. Seamlessly integrated into lithographic processes.

A compact, Nitrogen diffuser designed for contact mask aligners. Ensures an inert environment when curing Fleuron™ photoresists.

An advanced fluorinated developer designed for efficient and rapid removal of uncured Fleuron™ photoresist.

An advanced fluorine free developer designed for efficient and rapid removal of uncured Fleuron™ photoresist.